Nanomotion, a provider of advanced motion solutions, announced the successful delivery of its first prototype for a .25nm resolution stage designed for semiconductor metrology applications. This groundbreaking achievement marks a significant milestone in the company’s mission to enable next-generation tools for the semiconductor industry.
The new stage, developed using Nanomotion’s proprietary piezoelectric motor technology, offers unprecedented precision and stability. The stage has demonstrated a resolution of 0.25nm, making it an ideal solution for the demanding requirements of semiconductor metrology. The prototype was developed through a multidisciplinary approach, incorporating advanced mechanical design, control algorithms, and metrology techniques to ensure optimal performance.
“Our new .25nm resolution stage represents a significant advancement in semiconductor metrology technology,” said Gal Peled, CTO of Nanomotion. “This prototype demonstrates our commitment to pushing the boundaries of precision and stability in motion systems. We are excited to see the impact this technology will have on the semiconductor industry.”
The stage features a high-stiffness design, low signal-to-noise ratio (SNR), and advanced control algorithms that enable it to achieve sub-nanometer performance. The system includes a high-resolution encoder and a laser interferometer for precise position feedback, ensuring accurate and stable measurements. The stage’s performance has been validated through extensive testing, demonstrating its ability to achieve a position stability of 0.25nm.
Nanomotion is speeding time to market for next-gen tools, moving from the initial design of the custom stage to delivery of the prototype in 12 months, with the use of a digital twin model, which allows for comprehensive simulation and optimization of the stage’s performance before manufacturing. This process ensures that the final product meets the stringent requirements of semiconductor metrology applications. Extensive investment in a testing environment ensures the stage will meet sub-nano requirements within the working environment.
The core motion control technology is well suited for applications in:
- Mask and wafer manufacturing
- Lithography and pattern generation
- Wafer and mask metrology
- Defect inspection and verification
- Mask repair
The delivery of the first prototype is a milestone in Nanomotion’s collaboration with market leaders to advance semiconductor technology. The company continues to work closely with its customers to develop solutions that meet the emerging needs of the semiconductor industry.
