How Integrated Materials Solutions Speed Innovation

New solutions that rely on a unified database, machine learning and simulations are able to test, validate and provide customer insights into how materials work for new devices process flows, thereby speeding innovation.

Swagelok Introduces New ALD20 UHP Valve

The ALD20’s patent-pending design maximizes production process efficiency and deposition consistency by providing flow coefficients two to three times what can be achieved using today’s standard ALD valve technology.

ASM’s Haukka ALD Award

Dr. Suvi Haukka, executive scientist at ASM International, located in Finland, was awarded the ALD Innovation prize at the ALD 2016 Ireland conference (Figure), as chosen by the conference chairs. Haukka has had a lifetime career in Atomic Layer Deposition…

SAQP Specs for 7nm finFETs

As discussed in my last Ed’s Threads, lithography has become patterning as evidenced by first use of Self-Aligned Quadruple Patterning (SAQP) in High Volume Manufacturing (HVM) of memory chips. Meanwhile, industry R&D hub imec has been investigating use of SAQP…

Litho becomes Patterning

Once upon a time, lithographic (litho) processes were all that IC fabs needed to transfer the design-intent into silicon chips. Over the last 10-15 years, however, IC device structural features have continued to shrink below half the wavelength of the…

Electronic Materials Specifications and Markets

At SEMICON West this year, July 14-16 in San Francisco, the Chemical and Gas Manufacturers Group (CGMG) Committee of SEMI have organized an excellent program covering “Contamination Control in the Sub-20nm Era” to occur in the afternoon of the 14th…

ALD of Crystalline High-K SHTO on Ge

Alternative channel materials (ACM) such as germanium (Ge) will need to be integrated into future CMOS ICs, and one part of the integration was shown at the recent Materials Research Society (MRS) spring meeting by John Ekerdt, Associate Dean for…

Moore’s Law is Dead – (Part 3) Where?

…we reach the atomic limits of device scaling. At ~4nm pitch we run out of room “at the bottom,” after patterning costs explode at 45nm pitch. Lead bongo player of physics Richard Feynman famously said, “There’s plenty of room at…

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