SAQP Specs for 7nm finFETs

As discussed in my last Ed’s Threads, lithography has become patterning as evidenced by first use of Self-Aligned Quadruple Patterning (SAQP) in High Volume Manufacturing (HVM) of memory chips. Meanwhile, industry R&D hub imec has been investigating use of SAQP…

Litho becomes Patterning

Once upon a time, lithographic (litho) processes were all that IC fabs needed to transfer the design-intent into silicon chips. Over the last 10-15 years, however, IC device structural features have continued to shrink below half the wavelength of the…

CMOS-Photonic Integration Thermally Sensitive

As published in the journal Nature, CMOS transistors have been integrated with optical-resonator circuits using complex on-chip sensors and heaters to maintain temperature to within 1°C. While lacking the laser-source, these otherwise-fully-integrated solutions demonstrate both the capability as well as…

Apple Fab Speculation

Apple Corp. recent purchased an old 200mm-diameter silicon wafer fab in San Jose capable of creating as small as 90nm device features. Formerly owned and operated by Maxim, the US$18.2M purchase reportedly includes nearly 200 working fab tools. Some people…

EUV Cost at 1000 Daily Exposures

On October 14, 2015, ASML Holding N.V. (ASML) published its 2015 third-quarter results:  Q3 net sales of €1.55 billion with gross margin of 45.4% (in line with guidance), and guided Q4 2015 net sales at approximately €1.4 billion and a…

Leti Shows MEMS on 300mm Wafers

As reported by EETimes from the European MEMS Summit last month, French research institute CEA-Leti has manufactured accelerometer MEMS devices on 300mm-diameter wafers. This technology is currently being transferred to Tronics Microsystems SA (Grenoble, France), which currently only manufactures on…

Cross-point ReRAM Integration Claimed by Intel/Micron

The Intel/Micron joint-venture now claims to have successfully integrated a Resistive-RAM (ReRAM) made with an unannounced material in a cross-point architecture, switching using an undisclosed mechanism. Pilot production wafers are supposed to be moving through the Lehi fab, and samples…

Electronic Materials Specifications and Markets

At SEMICON West this year, July 14-16 in San Francisco, the Chemical and Gas Manufacturers Group (CGMG) Committee of SEMI have organized an excellent program covering “Contamination Control in the Sub-20nm Era” to occur in the afternoon of the 14th…

Nakamura on blue light history and future

Nobel Laureate Shuji Nakamura provided the keynote address to the attendees at the 57th annual Electronic Materials Conference held this week in Columbus, Ohio. His talk on “The History and Developments of InGaN-based LEDs and Laser Diodes” informed and entertained…

ALD of Crystalline High-K SHTO on Ge

Alternative channel materials (ACM) such as germanium (Ge) will need to be integrated into future CMOS ICs, and one part of the integration was shown at the recent Materials Research Society (MRS) spring meeting by John Ekerdt, Associate Dean for…

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