Veeco Instruments Inc. (NASDAQ: VECO) announced today that the University of Michigan has published a breakthrough study on atomic layer deposition (ALD) of molybdenum disulfide (MoS2) using di-tert-butyl disulfide (TBDS) as a replacement for hydrogen sulfide (H2S). Chemistry of Materials Journal published the work that was performed on Veeco’s Fiji G2 plasma enhanced ALD (PEALD) system.
Professor of Chemistry, Materials Science and Engineering at the University of Michigan Ageeth Bol and her team of students and postdoctoral students used a PEALD process to deposit high-quality 2D MoS2 using an organometallic precursor and TBDS, in combination with hydrogen (H2) plasma. This research introduces a method of using TBDS liquid that is significantly less hazardous than H2S and eliminates the need for expensive safety measures associated with H2S use.
“This development is an important step in the evolution of enabling large-scale integration of 2D transition metal di-chalcogenides into commercial devices,” said Ganesh Sundaram, vice president of technology for ALD and Molecular Beam Epitaxy (MBE) at Veeco. “The synthesis route undertaken by Professor Bol and her group resulted in high-quality, stoichiometric molybdenum disulfide film, and additionally resolves the safety and cost issues that can be associated with the use of traditional hydrogen sulfide-based processes.”
“We’ve been pleased with the performance and capabilities of the Fiji and with our interactions with Veeco’s scientific team,” stated Prof. Bol. “Indeed, we are in the process of commissioning a second Fiji system for our group, which is the third system received by the University of Michigan, to support further research activities.”
Growing interest in addressing the challenges of adopting two-dimensional (2D) materials in high-volume manufacturing has prompted a wide range of research and development activity, spurring collaboration between industry-leading equipment suppliers and stakeholders. Two-dimensional materials are extremely thin and have unique, controllable properties, including exceptional electrical conductivity, durability, and optical transparency. These properties enable applications in flexible displays, sensors, energy storage, and optoelectronics.
Veeco’s Fiji Plasma-Enhanced ALD system is a next-generation modular, high-vacuum thermal ALD system that supports thermal and plasma-enhanced deposition.
