The ULVAC Enviro-Optima™ Resist Strip System performs high-speed photo resist removal at more than 10µ/min, with excellent repeatability and high reliability for the lowest COO. The small footprint Enviro-Optima™ system is well suited for all resist strip work including difficult to strip resists, like SU-8; residue removal and surface preparation applications. www.ulvac.com
Resist Strip and Residue Cleaning System
