Spatial ALD is emerging as a critical technology for the deposition of thin films for advanced memory and logic selective processing found in gate-all-around FETs, high aspect ratio contacts, DRAM capacitors, advanced NVM technology, and even self-aligned double patterning (SADP) lithography. It has the promise of high throughput, highly conformal thin films using low temperature and low or no vacuum processing chambers. However spatial ALD has challenges, gas mixing, platform rotation speed optimization, optimized gas purge flow, the variable concentration of reactant gases and safety considerations are some of the issues process engineers are working to optimize. Atonarp’s Aston in-situ metrology solution will be reviewed and its key differentiations, being used by several spatial ALD OEMs to address these challenges, will be discussed.
What you’ll learn:
- Spatial ALD advantages and challenges
- Why speed with sensitivity and robustness matter in Spatial ALD metrology solutions
- Aston Impact and Plasma metrology solutions and differentiation that is leading them to be used as key in-situ process control metrology in spatial ALD applications
Martin Mason, VP of Product Marketing
About the Presenter:
Martin Mason is the VP of Product Marketing at Atonarp for Industrial products where he is responsible for the Aston product portfolio covering Semiconductor Solutions.
Martin has over 30 years of semiconductor industry experience including general manager roles at GlobalFoundries, for emerging memory and microcontroller products, Maxim Integrated for the signal chain mixed signal portfolio, and programmable logic and flash based FPGA solutions at Actel.
Martin holds over a dozen US patents in semiconductor security, packaging technology, eNVM, programable logic and software methodologies. He has authored many articles and white papers on topics as diverse as MRAM memory, in-situ process metrology, programmable mixed signal devices, analog data converters and low power non-volatile memory based programmable logic. He received his BEng. in Microelectronics from the University of Newcastle upon Tyne in the UK, but has lived and worked in San Jose, CA for the past 30 years.
Pete Singer, Editor-in-Chief
Atonarp is advancing semiconductor, clinical diagnostics, life science research and industrial process control through digital molecular profiling. The company’s products deliver actionable results that inform time-critical decisions. Founded in 2009, the Atonarp team collaborates across locations in Japan, India, and the United States. The Company is led by a world-class team of experts in the development and commercialization of analytical instruments and medical devices.