Enhanced Resistivity Measurements Provide
Tighter UPW Control at PoD and PoU

Originally held on April 11, 2023
Now available for On Demand viewing


Despite its very high purity, the ultrapure water (UPW) used in semiconductor manufacturing still contains trace levels of common metals and other electro-analytically detectable species that can negatively affect wafer yield. Resistivity measurement provides a cumulative measurement of these ions and is often used as the primary means of detecting ion impurity trends.

As the number of chips per wafer increases, the linewidths in the chip circuitry become narrower. With linewidths now in the single nanometer range, the effect of impurities on wafer yield is magnified. As a result, accurate, real-time monitoring of water quality released to points-of-distribution (PoDs) is more critical than ever, and highly accurate resistivity measurement is vital.

Through close collaboration with industry partners, METTLER TOLEDO has improved temperature compensation, signal stability, and environmental isolation to provide the most accurate temperature-compensated resistivity measurement possible.

Presented by:

Joel Kenyon
Global Product Manager, Conductivity & Transmitters

About the Presenter:

Joel is a biologist by education and has spent the last 12 years in product management for industrial analytical equipment.  For 4 years, Joel has been the Global Product Manager for conductivity/resistivity sensors and transmitters for Thornton, the pure water analytics division of METTLER TOLEDO.

Moderated by:

Pete Singer

Sponsored by:


METTLER TOLEDO Process Analytics produces analytical measurement solutions for industrial manufacturing processes. We focus on three main areas: liquid process analytics, pure water analytics, and gas analytics, offering measurements of resistivity/conductivity, pH, dissolved oxygen, dissolved ozone, oxidation-reduction potential (ORP), total organic carbon (TOC), microbial contamination, sodium ionic contamination, silica concentration, chloride and sulfate, and flow.

For more information, visit https://www.mt.com/global/en/home/pro