Patterning with Films and Chemicals

Somewhere around 40nm is the limit on the smallest half-pitch feature that can be formed with a single-exposure of 193-nm wavelength laser light using water immersion (193i) lithography. While multiple-patterning (MP) is needed to achieve tighter half-pitches, smaller features at…

ASML Books Production EUV Orders

TSMC commits to two tools for delivery next year Maybe, just maybe, ASML Holding N.V. (ASML) has made the near-impossible a reality by creating a cost-effective Extreme Ultra-Violet (EUV @ ~13.5nm wavelength) all-reflective lithographic tool. The company has announced that…

Moore’s Law is Dead – (Part 3) Where?

…we reach the atomic limits of device scaling. At ~4nm pitch we run out of room “at the bottom,” after patterning costs explode at 45nm pitch. Lead bongo player of physics Richard Feynman famously said, “There’s plenty of room at…

Moore’s Law is Dead – (Part 2) When?

…economics of lithography slow scaling. Moore’s Law had been on life support ever since the industry started needing Double-Patterning (DP) at 1/4-pitch of 193nm optical lithography. EUV lithography shows slow and steady progress in source and resist technologies, and ASML…

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