How to Solve Top ALD and ALE Semiconductor Processing Challenges

The key to precisely controlling the chemicals used in ALD and ALE during the thousands of “on and off” steps to deposit or etch one layer is the valve design.

Sub-fab Improvements Require Reliable Real-time and High Sensitivity In-situ Data

Robust, high speed and high sensitivity real-time data monitoring is essential for enabling rapid response and tight feedback loops.