At the VLSI Symposia in June, Intel presented a paper “Intel 4 CMOS Technology Featuring Advanced FinFET Transistors Optimized for High Density and High-Performance Computing.” Blogger Dick James reports on details of the interconnect strategy.
Bottoms-up ELD of Cobalt Plugs
As reported in more detail at Solid State Technology, during the IEEE IITC now happening in Grenoble, imec and Lam showed a new Electroless Deposition (ELD) cobalt (Co) process that is claimed to provide void-free bottoms-up pre-filling of vias and…
