Overcoming the Semiconductor EUV Fab Dilemma of Stochastics

While the conventional approach thinks of noise as a nuisance that must be thrown away, the Fractilia Inverse Linescan Model approach thinks of noise as information that should be measured and used.

EUVL Masks may need to be Tool-Specific

Extreme Ultra-Violet Lithography (EUVL) keeps hurting my brain. Just when I can understand how it could be used in profitable commercial high-volume manufacturing (HVM) I hear something that seriously strains my brain. First it was the mirrors and mask in…

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