Mid-Infrared Optical Metrology for High Aspect Ratio Holes in 3D NAND Manufacturing

Infrared critical dimension metrology (IRCD) addresses the shortcomings of conventional ultraviolet to near-infrared OCD in channel hole etch high-fidelity z-profile and amorphous carbon hardmask etch BCD metrology.

Metrology Solutions for Gate-All-Around Transistors in High Volume Manufacturing

High-speed, non-destructive OCD metrology has the capability needed to support process control throughout the GAA process flow.

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