The new GP200 Series is the industry’s first fully pressure-insensitive, pressure-based mass flow controller designed specifically for advanced etch and chemical vapor deposition processes in semiconductor manufacturing.
Providing ≤ ±1% process gas accuracy and ≤ ±0.15% S.P. repeatability, the ultrafast GP200 Series meets the critical requirements for high aspect ratio etch processes for TSV, MEMS and high-throughput continuous plasma processes.
Featuring a patented architecture that overcomes the limitations of conventional P-MFCs, the GP200 is designed to maintain accurate flow delivery of low vapor pressure and high-pressure gases into processes operating from high vacuum above atmospheric pressure. In comparison, conventional P-MFCs require high supply pressures and low outlet pressures or their performance quickly degrades. By offering a greater flexibility than conventional P-MFCs, the GP200 Series is the first universal pressure-based solution and upgrade for traditional P-MFCs and thermal MFCs.
The GP200’s extreme pressure insensitivity and zero leak-by valve (ZLV) technology enables design engineers to reduce gas panel complexity, size and cost by eliminating the need for point-of-use pressure regulators and transducers.
In addition to its GP200 Series P-MFC, Brooks will showcase other key products such as vacuum and pressure measurement sensors, gauges and instrumentation used in wafer process equipment and fab gas distribution.