Gigaphoton Inc. (Head Office: Oyama, Tochigi; President & CEO: Katsumi Uranaka), a manufacturer of light sources used in semiconductor lithography, announced on February 21, 2020 that it will add two new models to its ArF and KrF product lineups in 2020. The ArF immersion “GT66A” and the KrF “G60K” light sources will bring the very latest technologies to semiconductor lithography manufacturing.
With an increase in semiconductor applications due to rapidly emerging IoT and AI business growth, semiconductor chips are required to support even faster communication speeds and data process capabilities. Especially in 2020, 5G (5th generation mobile communication) services will be launched for general consumer use, meaning sub-10-nm node compact, high speed, and low power consumption logic ICs as well as large capacity memory chips for storing rapidly increasing amounts of data will be required.
The new GT66A ArF immersion laser is equipped with a newly developed optical module to reduce spatial coherence and improve beam uniformity on the exposed surface. The G60K KrF light source has undergone a full model change for the first time in about 15 years. Power output has been increased by a factor of 1.5x compared to the existing model by introducing a new power supply unit. Gigaphoton supports all chip manufacturers through these new technologies.
Katsumi Uranaka, President & CEO of Gigaphoton said, “The growing popularity of products and home appliances incorporating IoT capabilities, together with the addition of AI and 5G, are making it possible to view data in real-time and make equipment and devices smarter in a variety of settings including factories, medical care, automobiles, and social infrastructure. We are excited to contribute to the development of the next generation of the industrial sector with a new product lineup equipped with new technologies.”
