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Intel stands firm on 450mm; challenged by defects at 14nm

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Progress on 450mm at G450C
Comments (7)
  1. Sang Kim says:

    Due to the delay of Intel’s 14nm FinFET manufacturing to the first quarter of 2014, TSMC’s first 16nm FinFET will be the most advanced process technology to be manufactured below Intel’s 22nm node in the 4th quarter of 2013. The device electrical transfer characteristics to be presented at the IEDM look impressive, and will be very interesting if Intel’s 14nm FinFET data could be published for a comparison.

  2. Sang Kim says:

    Due to the delay of Intel’s 14nm FinFET manufacturing to the first quarter of 2014, TSMC’s first 16nm FinFET will be the most advanced process technology to be manufactured below Intel’s 22nm node in the 4th quarter of 2013. The device electrical transfer characteristics to be presented at the IEDM look impressive, and will be very interesting if Intel’s 14nm FinFET data could be published for comparison.

  3. Moorthy M. says:

    It is amazing that companies like Intel are pushing the limits of semiconductor technology in terms of reducing the transistor size and increasing the wafer size. I wish all the success to Intel.

  4. tarlinian says:

    By the standards TSMC is using for production, Intel has been in 14 nm production for probably a year. 1st quarter of 2014 is mass production of MPUs. No one has even taped out 16 nm finFET products yet (according to TSMC).

  5. Farshid says:

    I don’t think it is fair to compare Intel and TSMC’s as the two companies are pushing very different aspects of logic technology. TSMC is producing mostly general purpose processes for shrinking dies size. Intel is pushing the performance for processors with random logic, memory, pll, power management etc. There is a big difference in the deliverables the only commonality may be wafer size!

  6. John Lauria says:

    Is it truly a 14nm half pitch process or is this the equivalent expected planar process performance? Since the process technology is FINFET is the half pitch LW physically greater than 14nm?

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